Pono:
1. Hana maikaʻi ma lalo o ke kaiapuni paʻakikī (ke kiʻekiʻe o ka mahana, ka lepo, a pēlā aku.).
2. Hana paʻa a me ke ola lawelawe lōʻihi
3. Mālama maʻalahi, hana kūpono
Nā noi:
Hoʻohana nui ʻia nā aila lubrication aila lubrication i ka ʻike ʻana o ka liʻiliʻi ʻenehana, PVD, CVD, ion implantation, vacuum electronic components manufacturing, low-E aniani, ITO aniani, ʻōnohi uhi, nā pūnaewele lā, nā ʻūlū uila uila, umu ahi a me nā ʻoihana ʻē aʻe.
Hoakaka :
ʻO Flange (Ma) |
DN150 CF / ISO-K |
Max. Kaomi mau loa-holo mau (Pa) |
240 |
ʻO Flange (Ma waho) KF |
DN40 KF |
Max. Puʻupuʻu mau loa (Pa) |
N2: 350 |
ʻO ka wikiwiki pumping (L / s) |
N2: 600 |
Kinoea ma (sccm) |
N2 : 1200 |
He : 380 |
He : 880 |
||
H2 : 240 |
H2 : 700 |
||
Ar : 580 |
Ar : 450 |
||
Lākiō Hoʻopilikia |
N2 : 109 |
ʻO ka wikiwiki huli (rpm) |
36000 |
He : 105 |
ʻO ka manawa holo-manawa (min) |
9 |
|
H2 : 104 |
ʻAno ʻoluʻolu, Kūlana |
Wai / ʻEleʻele |
|
Ar : 109 |
ʻAi inu wai anuanu (L / min) |
1 |
|
Kaomi loa (Pa) |
CF : 6 × 10-8 |
Mahana anuanu (℃) |
25 |
ISO-K : 6 × 10-7 |
Hoʻohui Mana: Anakahi uila, V AC) |
220 ± 22 |
|
Ke Ana Hoʻohālike |
TCDP-II |
Max.Kauoha Mana (W) |
≤500 |